Well-Aligned Nanocylinder Formation in Phase-Separated Metal-Silicide–Silicon and Metal-Germanide–Germanium Systems



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Well-aligned nanocylinder formation (see figure) is carried out by using conventional sputtering deposition. Various metal-silicide–silicon and metal-germanide–germanium systems exhibit uniform phase separation with ordered cylinder arrays in a matrix with periodic spacing from 1.9 to 20.2 nm. There is a correlation between the periodic spacing of the cylinders and the eutectic temperatures in these systems.