Novel Complex Nanostructure from Directed Assembly of Block Copolymers on Incommensurate Surface Patterns

Authors

  • S. O. Kim,

    1. Department of Materials Science and Engineering, KAIST Institute of the Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701 (Korea)
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  • B. H. Kim,

    1. Department of Materials Science and Engineering, KAIST Institute of the Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701 (Korea)
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  • D. Meng,

    1. Department of Chemical and Biological Engineering, Colorado State University, Fort Collins, CO 80523 (USA)
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  • D. O. Shin,

    1. Department of Materials Science and Engineering, KAIST Institute of the Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701 (Korea)
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  • C. M. Koo,

    1. Department of Materials Science and Engineering, KAIST Institute of the Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701 (Korea)
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  • H. H. Solak,

    1. Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, 5232 Villigen PSI (Switzerland)
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  • Q. Wang

    1. Department of Chemical and Biological Engineering, Colorado State University, Fort Collins, CO 80523 (USA)
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  • The experimental portion of this research was performed in the laboratories of Prof. Paul F. Nealey at the University of Wisconsin. The authors thank National Nanofab Center (NNFC) in Korea for technical support for characterization. This work was supported by the second stage of the Brain Korea 21 Project, the Basic Research Program of the Korea Science & Engineering Foundation (R01-2005-000-10456-0), and Colorado State University. Supporting Information is available online from Wiley InterScience or from the authors.

Abstract

original image

A novel complex nanostructure, produced by the directed assembly of a block copolymer thin film on chemically patterned surfaces, is presented. The new nanostructure, which consists of cylinders oriented alternately parallel and perpendicular to the surface (see figure, a result of self-consistent field calculations), demonstrates that a judiciously designed chemical pattern may be used to fabricate a well-ordered complex nanostructure in block copolymer thin films.

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