This work was supported by the National Program for Tera-level Nano Devices, one of the 21st Century Frontier R&D Program funded by the Ministry of Science and Technology of Korea. Supporting Information is available online from Wiley InterScience or from the author.
Guided Formation of a Sub-10 nm Silicide Dot Array on an Area Patterned by Electron-Beam Lithography†
Article first published online: 2 OCT 2007
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 19, Issue 21, pages 3469–3472, November, 2007
How to Cite
Wi, J.-S., Lee, T.-Y., Kim, H.-M., Lee, H.-S., Nam, S. .-W., Shin, I. J., Shin, K. H. and Kim, K.-B. (2007), Guided Formation of a Sub-10 nm Silicide Dot Array on an Area Patterned by Electron-Beam Lithography. Adv. Mater., 19: 3469–3472. doi: 10.1002/adma.200701043
- Issue published online: 5 NOV 2007
- Article first published online: 2 OCT 2007
- Manuscript Revised: 1 JUN 2007
- Manuscript Received: 2 MAY 2007
- National Program for Tera-level Nano Devices, one of the 21st Century Frontier R&D Program funded by the Ministry of Science and Technology of Korea
Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2089/2007/c1043_s.pdf or from the author.
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