Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained from High Resolution Transmission Electron Microscopy

Authors


  • This work was supported from the National Program for Tera-level Nano Devices (TND), one of the 21st Century Frontier R&D Program funded by the Ministry of Science and Technology (MOST) of Korea. The authors are especially grateful to Profs. R. Sinclair, S. Jin, and D. Smith for their critical review of the manuscript. Supporting information is available online from Wiley InterScience or from the author.

Abstract

original image

An electron beam projection lithography technique that employs the various crystalline lattice images available in high-resolution transmission electron microscopy is reported. We successfully fabricated periodic arrays of various patterned structures with feature sizes of about 25 nm using single-crystalline Si and β-Si3N4 as the mask materials.

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