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Keywords:

  • Block Copolymers;
  • Crosslinking;
  • Poly(methyl methacrylate);
  • Polystyrene;
  • Surface Patterning;
  • Thin Films
Thumbnail image of graphical abstract

A new crosslinking system based on azide-functionalized random copolymers has been defined for the preparation of substrates with controllable surface interactions. The azido group is used for both thermal- and photo-crosslinking, which is found to be very efficient. Furthermore, the use of UV irradiation for crosslinking enables the preparation of patterned surfaces by conventional photolithographic techniques, combining the “bottom-up” self-assembly of block copolymer strategies with traditional “top-down” photolithographic methods.