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Facile Routes to Patterned Surface Neutralization Layers for Block Copolymer Lithography

Authors


  • This work was supported by the National Science Foundation under the MRSEC program (UCSB MRL, DMR-0520415 and UMass MRSEC, DMR-0213695), through an SRC-NRI supplement grant (2006-NE-1549), the Department of Energy, Office of Basic Energy Science and by the Korea Research Foundation Grant funded by the Korean Government (KRF-2005-214-D00272). The IMI Program of the National Science Foundation under Award No. DMR04-09848 is also thanked for providing a CISEI internship to C.S.

Abstract

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A new crosslinking system based on azide-functionalized random copolymers has been defined for the preparation of substrates with controllable surface interactions. The azido group is used for both thermal- and photo-crosslinking, which is found to be very efficient. Furthermore, the use of UV irradiation for crosslinking enables the preparation of patterned surfaces by conventional photolithographic techniques, combining the “bottom-up” self-assembly of block copolymer strategies with traditional “top-down” photolithographic methods.

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