Communication

Self-Sealing of Nanoporous Low Dielectric Constant Patterns Fabricated by Nanoimprint Lithography†

  1. Hyun Wook Ro1,
  2. Huagen Peng2,
  3. Ken-ichi Niihara3,
  4. Hae-Jeong Lee1,
  5. Eric K. Lin1,
  6. Alamgir Karim1,
  7. David W. Gidley2,
  8. Hiroshi Jinnai3,
  9. Do Y. Yoon4,
  10. Christopher L. Soles1,*

Article first published online: 15 APR 2008

DOI: 10.1002/adma.200701994

Issue

Advanced Materials

Advanced Materials

Volume 20, Issue 10, pages 1934–1939, May 19, 2008

Additional Information

How to Cite

Ro, H. W., Peng, H., Niihara, K.-i., Lee, H.-J., Lin, E. K., Karim, A., Gidley, D. W., Jinnai, H., Yoon, D. Y. and Soles, C. L. (2008), Self-Sealing of Nanoporous Low Dielectric Constant Patterns Fabricated by Nanoimprint Lithography. Advanced Materials, 20: 1934–1939. doi: 10.1002/adma.200701994

Author Information

  1. 1

    NIST Polymers Division 100 Bureau Drive, stop 8541, Gaithersburg, MD 20899 (USA)

  2. 2

    Department of Physics, University of Michigan Ann Arbor, MI 48109 (USA)

  3. 3

    Department of Polymer Science and Engineering Kyoto Institute of Technology Kyoto 606-8585 (Japan)

  4. 4

    Department of Chemistry, Seoul National University Seoul 151-747 (Korea)

*NIST Polymers Division 100 Bureau Drive, stop 8541, Gaithersburg, MD 20899 (USA).

  1. †

    Official contribution of the National Institute of Standards and Technology; not subject to copyright in the United States. This work is supported in part by NIST Office of Microelectronic Program, University of Michigan, the System IC 2010 Project of Korea, and the Chemistry and Molecular Engineering Program of Brain Korea 21 Project. We also acknowledge the Nanofabrication Laboratory of the Center for Nanoscale Science and Technology (CNST) in NIST for providing facilities for the NIL process.

Publication History

  1. Issue published online: 23 MAY 2008
  2. Article first published online: 15 APR 2008
  3. Manuscript Revised: 30 NOV 2007
  4. Manuscript Received: 9 JUL 2007

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Keywords:

  • nanolithography;
  • organosilicates;
  • patterning;
  • porous materials

Graphical Abstract

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The cross-sectional TEM image shows that line-space patterns can be directly imprinted, with high fidelity, into highly porous spin-on organosilicate materials. This publication quantifies how the porosity and distribution of pores within the patterns are affected by the nanoimprint lithography processes, including evidence for a densified pattern surface.

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