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Keywords:

  • nanolithography;
  • organosilicates;
  • patterning;
  • porous materials
Thumbnail image of graphical abstract

The cross-sectional TEM image shows that line-space patterns can be directly imprinted, with high fidelity, into highly porous spin-on organosilicate materials. This publication quantifies how the porosity and distribution of pores within the patterns are affected by the nanoimprint lithography processes, including evidence for a densified pattern surface.