Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks

Authors

  • Sivashankar Krishnamoorthy,

    1. Nanotechnology & Life Sciences section Swiss Center for Electronics and Microtechnology SA (CSEM SA) Neuchatel 2000 (Switzerland)
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  • Raphael Pugin,

    1. Nanotechnology & Life Sciences section Swiss Center for Electronics and Microtechnology SA (CSEM SA) Neuchatel 2000 (Switzerland)
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  • Juergen Brugger,

    1. Microsystems Laboratory (LMIS) Ecole Polytechnique Federale de Lausanne Ecublens 1015 (Switzerland)
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  • Harry Heinzelmann,

    1. Nanotechnology & Life Sciences section Swiss Center for Electronics and Microtechnology SA (CSEM SA) Neuchatel 2000 (Switzerland)
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  • Christian Hinderling

    Corresponding author
    1. Nanotechnology & Life Sciences section Swiss Center for Electronics and Microtechnology SA (CSEM SA) Neuchatel 2000 (Switzerland)
    • Nanotechnology & Life Sciences section Swiss Center for Electronics and Microtechnology SA (CSEM SA) Neuchatel 2000 (Switzerland).
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Abstract

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Nanopatterned self-assembled monolayers (SAMs) are obtained from a simple, straight-forward procedure by using masks derived from monolayers of block copolymer micelles. The nanopatterned SAMs consist of regularly spaced circular hydrophilic areas with diameters of approximately 60 nm on a continous hydrobhopic background or vice versa. The surfaces are shown to be excellent tools for the preparation of arrays of nanocrystals.

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