Communication

Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning†

  1. Bong Hoon Kim1,
  2. Dong Ok Shin1,
  3. Seong-Jun Jeong1,
  4. Chong Min Koo2,
  5. Sang Chul Jeon3,
  6. Wook Jung Hwang3,
  7. Sumi Lee4,
  8. Moon Gyu Lee4,
  9. Sang Ouk Kim1,*

Article first published online: 26 MAY 2008

DOI: 10.1002/adma.200702285

Issue

Advanced Materials

Advanced Materials

Volume 20, Issue 12, pages 2303–2307, June 18, 2008

Additional Information

How to Cite

Kim, B. H., Shin, D. O., Jeong, S.-J., Koo, C. M., Jeon, S. C., Hwang, W. J., Lee, S., Lee, M. G. and Kim, S. O. (2008), Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning. Advanced Materials, 20: 2303–2307. doi: 10.1002/adma.200702285

Author Information

  1. 1

    Department of Materials Science and Engineering KAIST Institute for the Nanocentury Korea Advanced Institute of Science and Technology (KAIST) Daejeon 305-701 (Korea)

  2. 2

    Hybrid Materials Research Center Korea Institute of Science and Technology (KIST) Cheongryang Seoul P.O. BOX 131 (Korea)

  3. 3

    National Nanofab Center (NNFC) 373-1 Guseong-dong Yuseong-gu Daejeon 305-701 (Korea)

  4. 4

    Samsung Advanced Institute of Technology (SAIT) Mt. 14-1 Nongseo-dong Giheung-gu Yongin-si Gyunggi-do 446-712 (Korea)

*Department of Materials Science and Engineering KAIST Institute for the Nanocentury Korea Advanced Institute of Science and Technology (KAIST) Daejeon 305-701 (Korea).

  1. †

    We thank Sung Soon Bai for providing technical support for SEM characterization. This work was supported by the Samsung Advanced Institute of Technology (SAIT), the Korea Research Foundation (KRF-2005-003-D00085), the second stage of the Brain Korea 21 Project, the Korea Science & Engineering Foundation (KOSEF) (R01-2005-000-10456-0), the Korean Ministry of Science and Technology, and the Fundamental R&D Program for Core Technology of Materials funded by the Korean Ministry of Commerce, Industry and Energy. Supporting Information is available online from Wiley InterScience or from the author.

Publication History

  1. Issue published online: 18 JUN 2008
  2. Article first published online: 26 MAY 2008
  3. Manuscript Revised: 2 NOV 2007
  4. Manuscript Received: 8 SEP 2007

Funded by

  • Samsung Advanced Institute of Technology (SAIT)
  • Korea Research Foundation. Grant Number: KRF-2005-003-D00085)
  • Korea Science & Engineering Foundation (KOSEF). Grant Number: R01-2005-000-10456-0

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Keywords:

  • Block copolymers;
  • Hierarchical structures;
  • Micropatterning;
  • Nanopatterning;
  • Self-organization

Graphical Abstract

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Hierarchical self-assembly of block copolymers has been achieved by two steps of sequential ordering processes, consisting of self-organized micropatterning from a dewetting block polymer solution and thermal annealing. The self-organized micropattern induces the spontaneous alignment of self-assembled lamellae (see figure), which is successfully applied for a lithography-free, ultra-large-scale nanopatterning.

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