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Advanced Materials

Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning

Authors

  • Bong Hoon Kim,

    1. Department of Materials Science and Engineering KAIST Institute for the Nanocentury Korea Advanced Institute of Science and Technology (KAIST) Daejeon 305-701 (Korea)
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  • Dong Ok Shin,

    1. Department of Materials Science and Engineering KAIST Institute for the Nanocentury Korea Advanced Institute of Science and Technology (KAIST) Daejeon 305-701 (Korea)
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  • Seong-Jun Jeong,

    1. Department of Materials Science and Engineering KAIST Institute for the Nanocentury Korea Advanced Institute of Science and Technology (KAIST) Daejeon 305-701 (Korea)
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  • Chong Min Koo,

    1. Hybrid Materials Research Center Korea Institute of Science and Technology (KIST) Cheongryang Seoul P.O. BOX 131 (Korea)
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  • Sang Chul Jeon,

    1. National Nanofab Center (NNFC) 373-1 Guseong-dong Yuseong-gu Daejeon 305-701 (Korea)
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  • Wook Jung Hwang,

    1. National Nanofab Center (NNFC) 373-1 Guseong-dong Yuseong-gu Daejeon 305-701 (Korea)
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  • Sumi Lee,

    1. Samsung Advanced Institute of Technology (SAIT) Mt. 14-1 Nongseo-dong Giheung-gu Yongin-si Gyunggi-do 446-712 (Korea)
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  • Moon Gyu Lee,

    1. Samsung Advanced Institute of Technology (SAIT) Mt. 14-1 Nongseo-dong Giheung-gu Yongin-si Gyunggi-do 446-712 (Korea)
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  • Sang Ouk Kim

    Corresponding author
    1. Department of Materials Science and Engineering KAIST Institute for the Nanocentury Korea Advanced Institute of Science and Technology (KAIST) Daejeon 305-701 (Korea)
    • Department of Materials Science and Engineering KAIST Institute for the Nanocentury Korea Advanced Institute of Science and Technology (KAIST) Daejeon 305-701 (Korea).
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  • We thank Sung Soon Bai for providing technical support for SEM characterization. This work was supported by the Samsung Advanced Institute of Technology (SAIT), the Korea Research Foundation (KRF-2005-003-D00085), the second stage of the Brain Korea 21 Project, the Korea Science & Engineering Foundation (KOSEF) (R01-2005-000-10456-0), the Korean Ministry of Science and Technology, and the Fundamental R&D Program for Core Technology of Materials funded by the Korean Ministry of Commerce, Industry and Energy. Supporting Information is available online from Wiley InterScience or from the author.

Abstract

Hierarchical self-assembly of block copolymers has been achieved by two steps of sequential ordering processes, consisting of self-organized micropatterning from a dewetting block polymer solution and thermal annealing. The self-organized micropattern induces the spontaneous alignment of self-assembled lamellae (see figure), which is successfully applied for a lithography-free, ultra-large-scale nanopatterning.

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