We thank Sung Soon Bai for providing technical support for SEM characterization. This work was supported by the Samsung Advanced Institute of Technology (SAIT), the Korea Research Foundation (KRF-2005-003-D00085), the second stage of the Brain Korea 21 Project, the Korea Science & Engineering Foundation (KOSEF) (R01-2005-000-10456-0), the Korean Ministry of Science and Technology, and the Fundamental R&D Program for Core Technology of Materials funded by the Korean Ministry of Commerce, Industry and Energy. Supporting Information is available online from Wiley InterScience or from the author.
Communication
Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning†
Article first published online: 26 MAY 2008
DOI: 10.1002/adma.200702285
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Kim, B. H., Shin, D. O., Jeong, S.-J., Koo, C. M., Jeon, S. C., Hwang, W. J., Lee, S., Lee, M. G. and Kim, S. O. (2008), Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning. Adv. Mater., 20: 2303–2307. doi: 10.1002/adma.200702285
- †
Publication History
- Issue published online: 18 JUN 2008
- Article first published online: 26 MAY 2008
- Manuscript Revised: 2 NOV 2007
- Manuscript Received: 8 SEP 2007
Funded by
- Samsung Advanced Institute of Technology (SAIT)
- Korea Research Foundation. Grant Number: KRF-2005-003-D00085)
- Korea Science & Engineering Foundation (KOSEF). Grant Number: R01-2005-000-10456-0
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