We thank Sung Soon Bai for providing technical support for SEM characterization. This work was supported by the Samsung Advanced Institute of Technology (SAIT), the Korea Research Foundation (KRF-2005-003-D00085), the second stage of the Brain Korea 21 Project, the Korea Science & Engineering Foundation (KOSEF) (R01-2005-000-10456-0), the Korean Ministry of Science and Technology, and the Fundamental R&D Program for Core Technology of Materials funded by the Korean Ministry of Commerce, Industry and Energy. Supporting Information is available online from Wiley InterScience or from the author.
Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning†
Version of Record online: 26 MAY 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 20, Issue 12, pages 2303–2307, June 18, 2008
How to Cite
Kim, B. H., Shin, D. O., Jeong, S.-J., Koo, C. M., Jeon, S. C., Hwang, W. J., Lee, S., Lee, M. G. and Kim, S. O. (2008), Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning. Adv. Mater., 20: 2303–2307. doi: 10.1002/adma.200702285
- Issue online: 18 JUN 2008
- Version of Record online: 26 MAY 2008
- Manuscript Revised: 2 NOV 2007
- Manuscript Received: 8 SEP 2007
- Samsung Advanced Institute of Technology (SAIT)
- Korea Research Foundation. Grant Number: KRF-2005-003-D00085)
- Korea Science & Engineering Foundation (KOSEF). Grant Number: R01-2005-000-10456-0
Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2089/2008/adma200702285_s.pdf or from the author.
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