Nanoimprint Lithography on Silica Sol–Gels: A Simple Route to Sequential Patterning

Authors

  • Christophe Peroz,

    1. Laboratoire Surface du Verre et Interfaces Unité Mixte CNRS/Saint-Gobain UMR 125 39 quai Lucien Lefranc, 93303 Aubervilliers (France)
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  • Vanessa Chauveau,

    1. Laboratoire Surface du Verre et Interfaces Unité Mixte CNRS/Saint-Gobain UMR 125 39 quai Lucien Lefranc, 93303 Aubervilliers (France)
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  • Etienne Barthel,

    1. Laboratoire Surface du Verre et Interfaces Unité Mixte CNRS/Saint-Gobain UMR 125 39 quai Lucien Lefranc, 93303 Aubervilliers (France)
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  • Elin Søndergård

    Corresponding author
    1. Laboratoire Surface du Verre et Interfaces Unité Mixte CNRS/Saint-Gobain UMR 125 39 quai Lucien Lefranc, 93303 Aubervilliers (France)
    • Laboratoire Surface du Verre et Interfaces Unité Mixte CNRS/Saint-Gobain UMR 125 39 quai Lucien Lefranc, 93303 Aubervilliers (France).
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  • The authors thank Dr. C. Heitz, Dr. J. M. Berquier, Dr. V. Goletto for useful discussions on sol–gel science and L. Homo and C. Papret for technical assistance.

Abstract

original image

Inorganic condensing sol-gel films are promising resist materials for nanoimprint lithography. We demonstrate that sequential patterning of these materials can be performed by controlling their condensation state. As a consequence, multilevel inorganic patterns can be obtained by superimposing structures, as show here, where successive stamping of a line pattern leads to two-level square features.

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