Communication

The Patterning of Sub-500 nm Inorganic Oxide Structures†

  1. Meredith J. Hampton1,
  2. Stuart S. Williams1,
  3. Zhilian Zhou3,
  4. Janine Nunes1,
  5. Doo-Hyun Ko1,
  6. Joseph L. Templeton1,
  7. Edward T. Samulski1,
  8. Joseph M. DeSimone1,2,*

Article first published online: 2 JUN 2008

DOI: 10.1002/adma.200702495

Issue

Advanced Materials

Advanced Materials

Volume 20, Issue 14, pages 2667–2673, July 17, 2008

Additional Information

How to Cite

Hampton, M. J., Williams, S. S., Zhou, Z., Nunes, J., Ko, D.-H., Templeton, J. L., Samulski, E. T. and DeSimone, J. M. (2008), The Patterning of Sub-500 nm Inorganic Oxide Structures. Advanced Materials, 20: 2667–2673. doi: 10.1002/adma.200702495

Author Information

  1. 1

    Department of Chemistry University of North Carolina at Chapel Hill CB #3290, Caudill Labs, Chapel Hill, NC 27599 (USA)

  2. 2

    Department of Chemical Engineering North Carolina State University Raleigh, NC 27695 (USA)

  3. 3

    Liquidia Technologies, P.O. Box 110085 Research Triangle Park, NC 27709 (USA)

*Department of Chemistry University of North Carolina at Chapel Hill CB #3290, Caudill Labs, Chapel Hill, NC 27599 (USA).

  1. †

    M.J.H. and S.S.W. contributed equally to this work. We acknowledge the help of P. White (X-ray diffractometry), David Shirvanyants (image analysis), and Kevin Herlihy (figures). This work was partially supported by the Office of Naval Research, the STC program of the National Science Foundation, NSF (NIRT: Bio-Inspired Actuating Structures CMS-0507151), NASA (URETI “Biologically Inspired Materials” Grant NAG-1-2301), the Army Research Office, and the William R. Kenan Jr. Distinguished Professorship.

Publication History

  1. Issue published online: 23 JUL 2008
  2. Article first published online: 2 JUN 2008
  3. Manuscript Received: 4 OCT 2007

Funded by

  • M.J.H.
  • S.S.W.
  • Naval Research
  • STC program of the National Science Foundation, NSF
  • NIRT. Grant Number: CMS-0507151
  • NASA
  • URETI. Grant Number: NAG-1-2301

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Keywords:

  • patterning;
  • soft lithography;
  • perfluoropolyether elastomers;
  • polymers;
  • embossing;
  • inorganic oxides

Graphical Abstract

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Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including TiO2, SnO2, ZnO, ITO, and BaTiO3 are patterned on a variety of substrates with different aspect ratios. An example of TiO2 posts is shown in the figure.

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