Fabrication of Mesoporous Functionalized Arrays by Integrating Deep X-Ray Lithography with Dip-Pen Writing

Authors

  • Paolo Falcaro,

    1. Associazione CIVEN – Nano Fabrication Facility Via delle Industrie 9, 30175 Marghera VE (Italy)
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  • Stefano Costacurta,

    1. Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT) Università di Sassari Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy)
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  • Luca Malfatti,

    1. Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT) Università di Sassari Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy)
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  • Masahide Takahashi,

    1. Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT) Università di Sassari Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy)
    2. Institute for Chemical Research Kyoto University Gokasho Uji, Kyoto 611-0011 (Japan)
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  • Tongjit Kidchob,

    1. Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT) Università di Sassari Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy)
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  • Maria Francesca Casula,

    1. Dipartimento di Scienze Chimiche Università di Cagliari S.S. 554 bivio per Sestu, 09042 Monserrato CA (Italy)
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  • Massimo Piccinini,

    1. Laboratori Nazionali di Frascati – INFN Via E. Fermi 40, 00044 Frascati RM (Italy)
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  • Augusto Marcelli,

    1. Laboratori Nazionali di Frascati – INFN Via E. Fermi 40, 00044 Frascati RM (Italy)
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  • Benedetta Marmiroli,

    1. Institute of Biophysics and Nanosystems Structure Research Austrian Academy of Sciences Schmiedlstraße 6, 8042, Graz (Austria)
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  • Heinz Amenitsch,

    1. Institute of Biophysics and Nanosystems Structure Research Austrian Academy of Sciences Schmiedlstraße 6, 8042, Graz (Austria)
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  • Piero Schiavuta,

    1. Associazione CIVEN – Nano Fabrication Facility Via delle Industrie 9, 30175 Marghera VE (Italy)
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  • Plinio Innocenzi

    Corresponding author
    1. Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT) Università di Sassari Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy)
    • Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT) Università di Sassari Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy).
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  • This work was supported by the Italian Ministero dell'Università e della Ricerca, through grant FIRB 2003 (RBNEO33KMA) and the E.U. through SAXIER Contract n. 011934. A. Patelli is acknowledged for experimental support. Supporting Information is available online from Wiley InterScience or from the authors.

Abstract

original image

Deep X-ray lithography (DXRL) allows the highly controlled patterning of mesoporous films (see figure). This technique requires no resist, enabling direct patterning without causing mesostructure degradation. Increase of silica polycondensation and partial removal of the templating agent is induced by synchrotron radiation. Selective functionalization of the mesoporous objects is achieved by combining DXRL with dip-pen writing.

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