Communication

Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers†

  1. Seong-Jun Jeong,
  2. Guodong Xia,
  3. Bong Hoon Kim,
  4. Dong Ok Shin,
  5. Se-Hun Kwon,
  6. Sang-Won Kang,
  7. Sang Ouk Kim*

Article first published online: 15 APR 2008

DOI: 10.1002/adma.200702930

Issue

Advanced Materials

Advanced Materials

Volume 20, Issue 10, pages 1898–1904, May 19, 2008

Additional Information

How to Cite

Jeong, S.-J., Xia, G., Kim, B. H., Shin, D. O., Kwon, S.-H., Kang, S.-W. and Kim, S. O. (2008), Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers. Advanced Materials, 20: 1898–1904. doi: 10.1002/adma.200702930

Author Information

  1. Department of Materials Science and Engineering KAIST Institute for the Nanocentury, KAIST Daejeon 305-701 (Korea)

*Department of Materials Science and Engineering KAIST Institute for the Nanocentury, KAIST Daejeon 305-701 (Korea).

  1. †

    We thank G. S. Kim and J.-H. Ahn for assistance with thin film depositions, and S. S. Bae for assistance with SEM analysis. This work was supported by the second stage of the Brain Korea 21 Project, the Korea Research Foundation (KRF-2005-003-D00085), the Basic Research Program of the Korea Science & Engineering Foundation (R01-2005- 000-10456-0), the Korean Ministry of Science and Technology, and the Korean Ministry of Science and Technology and Fundamental R&D Program for Core Technology of Materials funded by the Korean Ministry of Commerce, Industry and Energy. Also, this work was partially supported by grants-in-aid for the National Core Research Center Program from MOST/KOSEF (No. R15-2006-022-01001-0).

Publication History

  1. Issue published online: 23 MAY 2008
  2. Article first published online: 15 APR 2008
  3. Manuscript Revised: 21 DEC 2007
  4. Manuscript Received: 23 NOV 2007

Funded by

  • Brain Korea 21 Project
  • Korea Research Foundation. Grant Number: (KRF-2005-003-D00085)
  • Basic Research Program of the Korea Science & Engineering Foundation
  • (R01-2005- 000-10456-0)
  • Korean Ministry of Science and Technology
  • Korean Ministry of Science and Technology and Fundamental R&D Program for Core Technology of Materials funded by the Korean Ministry of Commerce, Industry and Energy
  • National Core Research Center Program from MOST/KOSEF. Grant Number: (No. R15-2006-022-01001-0)

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Keywords:

  • block copolymers;
  • ceramics;
  • lithography;
  • metals;
  • nanopatterning;
  • semiconductors

Graphical Abstract

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A universal block copolymer lithography is developed for a broad spectrum of materials including metals, semiconductors, ceramics, and polymers by combining advanced film deposition techniques with block copolymer lithography. The figure presents a nanopatterned platinum film prepared by applying universal block copolymer lithography.

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