We thank G. S. Kim and J.-H. Ahn for assistance with thin film depositions, and S. S. Bae for assistance with SEM analysis. This work was supported by the second stage of the Brain Korea 21 Project, the Korea Research Foundation (KRF-2005-003-D00085), the Basic Research Program of the Korea Science & Engineering Foundation (R01-2005- 000-10456-0), the Korean Ministry of Science and Technology, and the Korean Ministry of Science and Technology and Fundamental R&D Program for Core Technology of Materials funded by the Korean Ministry of Commerce, Industry and Energy. Also, this work was partially supported by grants-in-aid for the National Core Research Center Program from MOST/KOSEF (No. R15-2006-022-01001-0).
Communication
Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers†
Article first published online: 15 APR 2008
DOI: 10.1002/adma.200702930
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Jeong, S.-J., Xia, G., Kim, B. H., Shin, D. O., Kwon, S.-H., Kang, S.-W. and Kim, S. O. (2008), Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers. Adv. Mater., 20: 1898–1904. doi: 10.1002/adma.200702930
- †
Publication History
- Issue published online: 23 MAY 2008
- Article first published online: 15 APR 2008
- Manuscript Revised: 21 DEC 2007
- Manuscript Received: 23 NOV 2007
Funded by
- Brain Korea 21 Project
- Korea Research Foundation. Grant Number: (KRF-2005-003-D00085)
- Basic Research Program of the Korea Science & Engineering Foundation
- (R01-2005- 000-10456-0)
- Korean Ministry of Science and Technology
- Korean Ministry of Science and Technology and Fundamental R&D Program for Core Technology of Materials funded by the Korean Ministry of Commerce, Industry and Energy
- National Core Research Center Program from MOST/KOSEF. Grant Number: (No. R15-2006-022-01001-0)
- Abstract
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