We thank E. J. W. Crossland for his help with solvent annealing and degradation experiments. We acknowledge financial support from the Dutch “Stichting voor Fundamenteel Onderzoek der Materie” (FOM) (The Netherlands) for N.E.V., and the European Network “Polyfilm” under RTN-6 for S.L. and U.S.
Alignment of Lamellar Block Copolymers via Electrohydrodynamic-Driven Micropatterning†
Version of Record online: 15 JUL 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 20, Issue 16, pages 3022–3027, August 18, 2008
How to Cite
Voicu, N. E., Ludwigs, S. and Steiner, U. (2008), Alignment of Lamellar Block Copolymers via Electrohydrodynamic-Driven Micropatterning. Adv. Mater., 20: 3022–3027. doi: 10.1002/adma.200702970
- Issue online: 14 AUG 2008
- Version of Record online: 15 JUL 2008
- Manuscript Revised: 14 APR 2008
- Manuscript Received: 19 MAR 2008
- Dutch “Stichting voor Fundamenteel Onderzoek der Materie” (FOM) (The Netherlands) for N.E.V.
- European Network “Polyfilm” under RTN-6 for S.L. and U.S.
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