The authors would like to thank the UW–NSF Nanoscale Science and Engineering Center (NSEC) (Grant No. DMR 0425880) and the Center on Functional Engineered Nano Architectonics (FENA) at UCLA for financial support.
Communication
Preparation of Neutral Wetting Brushes for Block Copolymer Films from Homopolymer Blends†
Article first published online: 7 JUL 2008
DOI: 10.1002/adma.200800048
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Ji, S., Liu, G., Zheng, F., Craig, G. S. W., Himpsel, F. J. and Nealey, P. F. (2008), Preparation of Neutral Wetting Brushes for Block Copolymer Films from Homopolymer Blends. Advanced Materials, 20: 3054–3060. doi: 10.1002/adma.200800048
- †
Publication History
- Issue published online: 14 AUG 2008
- Article first published online: 7 JUL 2008
- Manuscript Revised: 14 FEB 2008
- Manuscript Received: 7 JAN 2008
Funded by
- UW–NSF Nanoscale Science and Engineering Center (NSEC). Grant Number: DMR 0425880
- Center on Functional Engineered Nano Architectonics (FENA) at UCLA
- Abstract
- References
- Cited By
Keywords:
- block copolymers;
- brushes;
- poly(methyl methacrylate);
- polystyrene;
- self-assembly
Graphical Abstract

Neutral brush layers are prepared from a ternary blend of two low-molecular-weight homopolymers and their corresponding low-molecular-weight block copolymer. The presence of block copolymer effectively emulsifies the homopolymer mixtures on substrates and mediates their grafting ratios.

1521-4095/asset/olbannercenter.gif?v=1&s=529a7434a29cae1cc1d6c7ab89395d70e2677ce1)
