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Advanced Materials

Photo-embossed Surface Relief Structures with an Increased Aspect Ratios by Addition of a Reversible Addition-Fragmentation Chain Transfer Agent

Authors

  • Jolke Perelaer,

    1. Laboratory of Macromolecular Chemistry and Nanoscience Polymers in Information and Communication Technology Group Department of Chemical Engineering Eindhoven University of Technology and Dutch Polymer Polymer Institute (DPI) P.O. Box 513, 5600 MB Eindhoven (The Netherlands)
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  • Ko Hermans,

    1. Laboratory of Macromolecular Chemistry and Nanoscience Polymers in Information and Communication Technology Group Department of Chemical Engineering Eindhoven University of Technology and Dutch Polymer Polymer Institute (DPI) P.O. Box 513, 5600 MB Eindhoven (The Netherlands)
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  • Cees W. M. Bastiaansen,

    1. Laboratory of Macromolecular Chemistry and Nanoscience Polymers in Information and Communication Technology Group Department of Chemical Engineering Eindhoven University of Technology and Dutch Polymer Polymer Institute (DPI) P.O. Box 513, 5600 MB Eindhoven (The Netherlands)
    2. Department of Materials Queen Mary, University of London Mile End Road, E14NS, London (UK)
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  • Dirk J. Broer,

    1. Laboratory of Macromolecular Chemistry and Nanoscience Polymers in Information and Communication Technology Group Department of Chemical Engineering Eindhoven University of Technology and Dutch Polymer Polymer Institute (DPI) P.O. Box 513, 5600 MB Eindhoven (The Netherlands)
    2. Philips Research Laboratories High Tech Campus 4 5656 AE Eindhoven (The Netherlands)
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  • Ulrich S. Schubert

    Corresponding author
    1. Laboratory of Macromolecular Chemistry and Nanoscience Polymers in Information and Communication Technology Group Department of Chemical Engineering Eindhoven University of Technology and Dutch Polymer Polymer Institute (DPI) P.O. Box 513, 5600 MB Eindhoven (The Netherlands)
    2. Laboratory of Organic and Macromolecular Chemistry Friedrich-Schiller-University Jena Humboldtstr. 10, 07743 Jena (Germany)
    • Laboratory of Macromolecular Chemistry and Nanoscience Polymers in Information and Communication Technology Group Department of Chemical Engineering Eindhoven University of Technology and Dutch Polymer Polymer Institute (DPI) P.O. Box 513, 5600 MB Eindhoven (The Netherlands).
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  • The research of J.P. and K.H. forms part of the research program (#546 and #530) of the Dutch Polymer Institute (DPI). The authors would like to thank Dr. Richard Hoogenboom, Ing. Martin Fijten, and Drs. Hector Tello Manon for discussions, and the Dutch Polymer Institute for financial support.

Abstract

photo-embossed surface relief structures with significantly increased aspect ratios are prepared by addition of a reversible addition fragmentation chain transfer agent. The aspect ratios under inert atmosphere are successfully improved by a factor of almost 10. Moreover, aspect ratios obtained under ambient circumstances, preferred for industrial applications, are also significantly enhanced.

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