The authors would like to acknowledge the financial support from the NSF MRSEC program (DMR-0213918). Supporting Information is available online from Wiley InterScience or from the authors.
Formation and Surface Modification of Nanopatterned Thiol-ene Substrates using Step and Flash Imprint Lithography†
Article first published online: 14 JUL 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 20, Issue 17, pages 3308–3313, September 3, 2008
How to Cite
Khire, V. S., Yi, Y., Clark, N. A. and Bowman, C. N. (2008), Formation and Surface Modification of Nanopatterned Thiol-ene Substrates using Step and Flash Imprint Lithography. Adv. Mater., 20: 3308–3313. doi: 10.1002/adma.200800672
- Issue published online: 1 SEP 2008
- Article first published online: 14 JUL 2008
- Manuscript Received: 3 MAR 2008
- NSF MRSEC program. Grant Number: DMR-0213918
- nanoimprint lithography;
- polymeric materials;
Functionalized, thiol-ene nanopatterned materials are fabricated using step and flash imprint lithography (SFIL) and are readily modified with a micropatterned, secondary polymer layer through the unreacted pendant thiols on the surface. Thiol-enes offer versatile chemistry, rapid curing and excellent control over polymer properties using stoichiometry and functionality for both base substrate and attached secondary polymer layer.