Communication

Formation and Surface Modification of Nanopatterned Thiol-ene Substrates using Step and Flash Imprint Lithography†

  1. Vaibhav S. Khire1,
  2. Youngwoo Yi2,
  3. Noel A. Clark2,
  4. Christopher N. Bowman1,*

Article first published online: 14 JUL 2008

DOI: 10.1002/adma.200800672

Issue

Advanced Materials

Advanced Materials

Volume 20, Issue 17, pages 3308–3313, September 3, 2008

Additional Information

How to Cite

Khire, V. S., Yi, Y., Clark, N. A. and Bowman, C. N. (2008), Formation and Surface Modification of Nanopatterned Thiol-ene Substrates using Step and Flash Imprint Lithography. Adv. Mater., 20: 3308–3313. doi: 10.1002/adma.200800672

Author Information

  1. 1

    Department of Chemical and Biological Engineering, University of Colorado Boulder, Colorado 80309-0424 (USA)

  2. 2

    Department of Physics and Liquid Crystal Materials Research Center, University of Colorado Boulder, CO 80309 (USA)

*Department of Chemical and Biological Engineering, University of Colorado Boulder, Colorado 80309-0424 (USA).

  1. †

    The authors would like to acknowledge the financial support from the NSF MRSEC program (DMR-0213918). Supporting Information is available online from Wiley InterScience or from the authors.

Publication History

  1. Issue published online: 1 SEP 2008
  2. Article first published online: 14 JUL 2008
  3. Manuscript Received: 3 MAR 2008

Funded by

  • NSF MRSEC program. Grant Number: DMR-0213918

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Keywords:

  • nanoimprint lithography;
  • polymeric materials;
  • polymerization;
  • thiol-ene
Thumbnail image of graphical abstract

Functionalized, thiol-ene nanopatterned materials are fabricated using step and flash imprint lithography (SFIL) and are readily modified with a micropatterned, secondary polymer layer through the unreacted pendant thiols on the surface. Thiol-enes offer versatile chemistry, rapid curing and excellent control over polymer properties using stoichiometry and functionality for both base substrate and attached secondary polymer layer.

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