Advanced Materials

Single-Photon and Two-Photon Induced Photocleavage for Monolayers of an Alkyltriethoxysilane with a Photoprotected Carboxylic Ester

Authors


  • M. Álvarez thanks Junta de Comunidades Castilla la Mancha for a postdoctoral fellowship. Financial support by the European Commission through the Nano3D project, NMP4-CT-2005-014006 is highly appreciated.

Abstract

The photochemical structuring of a polysiloxane monolayer protected with a photocleavable group is shown by femtosecond laser pulses in the near infrared. These experiments suggest a two-photon induced deprotection process that holds great promise for near-field monolayer photolithography far below the diffraction limit.

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