The work was principally supported by Science Foundation Ireland (SFI) under the Principal Investigator Programme Contract No. 06/IN.1/I85 and the National Access Programme, NAP89. Enterprise Ireland funding under PC/2006/332 for S. A. is also acknowledged. The authors thank Prof. Noel Buckley for access to Hitachi S4800 HRSEM and useful discussions. Access to Rigaku MicroMax-007 SAXS from Prof. Martin Caffrey is further acknowledged. Supporting Information is available online from Wiley InterScience or from the authors.
Communication
Close-Packed Gold-Nanocrystal Assemblies Deposited with Complete Selectivity into Lithographic Trenches†
Article first published online: 22 OCT 2008
DOI: 10.1002/adma.200801007
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Ahmed, S. and Ryan, K. M. (2008), Close-Packed Gold-Nanocrystal Assemblies Deposited with Complete Selectivity into Lithographic Trenches. Adv. Mater., 20: 4745–4750. doi: 10.1002/adma.200801007
- †
Publication History
- Issue published online: 16 DEC 2008
- Article first published online: 22 OCT 2008
- Manuscript Revised: 29 JUL 2008
- Manuscript Received: 11 APR 2008
Funded by
- Enterprise Ireland. Grant Number: PC/2006/332
Keywords:
- close-packed assembly;
- electric-field deposition;
- gold nanocrystals;
- lithography

Close-packed gold-nanocrystal assemblies are selectively deposited into trenches (300 nm × 300 nm) fabricated by electron-beam lithography. The base of the trenches consists of highly doped silicon with 30 nm silica walls. The assemblies are formed using electric-field mediated deposition of8 nm gold spheres from organic solvents.

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