Communication

Stop-Flow Lithography of Colloidal, Glass, and Silicon Microcomponents†

  1. Robert F. Shepherd1,
  2. Priyadarshi Panda2,
  3. Zhihao Bao3,
  4. Kenneth H. Sandhage3,
  5. T. Alan Hatton2,
  6. Jennifer A. Lewis1,*,
  7. Patrick S. Doyle1,*

Article first published online: 4 NOV 2008

DOI: 10.1002/adma.200801090

Issue

Advanced Materials

Advanced Materials

Volume 20, Issue 24, pages 4734–4739, December 17, 2008

Additional Information

How to Cite

Shepherd, R. F., Panda, P., Bao, Z., Sandhage, K. H., Hatton, T. A., Lewis, J. A. and Doyle, P. S. (2008), Stop-Flow Lithography of Colloidal, Glass, and Silicon Microcomponents. Adv. Mater., 20: 4734–4739. doi: 10.1002/adma.200801090

Author Information

  1. 1

    Department of Material Science and Engineering, University of Illinois, U-C 1304 W Green St., Urbana, IL 61801 (USA)

  2. 2

    Department of Chemical Engineering, Massachusetts Institute of Technology 77 Massachusetts Avenue, Cambridge, MA 02139 (USA)

  3. 3

    School of Material Science and Engineering, Georgia Institute of Technology 771 Ferst Drive, Atlanta, GA 30332 (USA)

*Department of Material Science and Engineering, University of Illinois, U-C 1304 W Green St., Urbana, IL 61801 (USA).

  1. †

    R. F. S and P. P contributed equally to this work. J. A. L., P. S. D., and K. H. S. designed the research; R. F. S., P. P., and Z. B. performed the research, R. F. S., P. P., J. A. L., and P. S. D. wrote the paper. This material is based on work supported by the National Science Foundation (DMR-0652424, CTS-0120978 and CTS-0304128) and the Air Force Office of Scientific Research (FA9550-05-1-0092). The authors thank A. Deconinck for software development, K. Erickson, S. M. Menke, A. Cote, and A. Balducci for useful discussions, and M. McConney and S. MacLaren for assistance with AFM.

Publication History

  1. Issue published online: 16 DEC 2008
  2. Article first published online: 4 NOV 2008
  3. Manuscript Received: 20 APR 2008

SEARCH

SEARCH BY CITATION

ARTICLE TOOLS

Get PDF (564K)

Keywords:

  • ceramics;
  • colloids;
  • microelectromechanical systems;
  • microfluidics;
  • silicon
Thumbnail image of graphical abstract

Stop-flow lithography (SFL) is used for patterning colloidal building blocks into controlled structures (gears and other shapes) at rates that exceed 103 min−1 using an index-matched system composed of silica microspheres suspended in a photocurable acrylamide solution as shown in the figure. These structures are dried and then transformed, in batch, at elevated temperatures into microcomponents composed of porous or glassy silicon oxide or porous silicon via magnesiothermic reduction.

Get PDF (564K)