Communication

Stop-Flow Lithography of Colloidal, Glass, and Silicon Microcomponents†

  1. Robert F. Shepherd1,
  2. Priyadarshi Panda2,
  3. Zhihao Bao3,
  4. Kenneth H. Sandhage3,
  5. T. Alan Hatton2,
  6. Jennifer A. Lewis1,*,
  7. Patrick S. Doyle1,*

Article first published online: 4 NOV 2008

DOI: 10.1002/adma.200801090

Issue

Advanced Materials

Advanced Materials

Volume 20, Issue 24, pages 4734–4739, December 17, 2008

Additional Information

How to Cite

Shepherd, R. F., Panda, P., Bao, Z., Sandhage, K. H., Hatton, T. A., Lewis, J. A. and Doyle, P. S. (2008), Stop-Flow Lithography of Colloidal, Glass, and Silicon Microcomponents. Adv. Mater., 20: 4734–4739. doi: 10.1002/adma.200801090

Author Information

  1. 1

    Department of Material Science and Engineering, University of Illinois, U-C 1304 W Green St., Urbana, IL 61801 (USA)

  2. 2

    Department of Chemical Engineering, Massachusetts Institute of Technology 77 Massachusetts Avenue, Cambridge, MA 02139 (USA)

  3. 3

    School of Material Science and Engineering, Georgia Institute of Technology 771 Ferst Drive, Atlanta, GA 30332 (USA)

*Department of Material Science and Engineering, University of Illinois, U-C 1304 W Green St., Urbana, IL 61801 (USA).

  1. †

    R. F. S and P. P contributed equally to this work. J. A. L., P. S. D., and K. H. S. designed the research; R. F. S., P. P., and Z. B. performed the research, R. F. S., P. P., J. A. L., and P. S. D. wrote the paper. This material is based on work supported by the National Science Foundation (DMR-0652424, CTS-0120978 and CTS-0304128) and the Air Force Office of Scientific Research (FA9550-05-1-0092). The authors thank A. Deconinck for software development, K. Erickson, S. M. Menke, A. Cote, and A. Balducci for useful discussions, and M. McConney and S. MacLaren for assistance with AFM.

Publication History

  1. Issue published online: 16 DEC 2008
  2. Article first published online: 4 NOV 2008
  3. Manuscript Received: 20 APR 2008

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