R. F. S and P. P contributed equally to this work. J. A. L., P. S. D., and K. H. S. designed the research; R. F. S., P. P., and Z. B. performed the research, R. F. S., P. P., J. A. L., and P. S. D. wrote the paper. This material is based on work supported by the National Science Foundation (DMR-0652424, CTS-0120978 and CTS-0304128) and the Air Force Office of Scientific Research (FA9550-05-1-0092). The authors thank A. Deconinck for software development, K. Erickson, S. M. Menke, A. Cote, and A. Balducci for useful discussions, and M. McConney and S. MacLaren for assistance with AFM.
Stop-Flow Lithography of Colloidal, Glass, and Silicon Microcomponents†
Version of Record online: 4 NOV 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 20, Issue 24, pages 4734–4739, December 17, 2008
How to Cite
Shepherd, R. F., Panda, P., Bao, Z., Sandhage, K. H., Hatton, T. A., Lewis, J. A. and Doyle, P. S. (2008), Stop-Flow Lithography of Colloidal, Glass, and Silicon Microcomponents. Adv. Mater., 20: 4734–4739. doi: 10.1002/adma.200801090
- Issue online: 16 DEC 2008
- Version of Record online: 4 NOV 2008
- Manuscript Received: 20 APR 2008
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