Get access
Advanced Materials

Non-Relief-Pattern Lithography Patterning of Solution Processed Organic Semiconductors

Authors

  • Sung Kyu Park,

    1. Center for Thin Film Devices and Materials Research Institute Department of Electrical Engineering, Penn State University University Park, PA 16802 (USA) Korea Electronics Technology Institutes, Kyunggi (South Korea)
    Search for more papers by this author
  • Devin A. Mourey,

    1. Center for Thin Film Devices and Materials Research Institute Department of Material Science Engineering, Penn State University University Park, PA 16802 (USA)
    Search for more papers by this author
  • Sankar Subramanian,

    1. Department of Chemistry, University of Kentucky Lexington, KY 40506 (USA)
    Search for more papers by this author
  • John E. Anthony,

    1. Department of Chemistry, University of Kentucky Lexington, KY 40506 (USA)
    Search for more papers by this author
  • Thomas N. Jackson

    Corresponding author
    1. Center for Thin Film Devices and Materials Research Institute Department of Electrical Engineering, Penn State University University Park, PA 16802 (USA)
    • Center for Thin Film Devices and Materials Research Institute Department of Electrical Engineering, Penn State University University Park, PA 16802 (USA).
    Search for more papers by this author

  • The authors gratefully acknowledge financial support by the National Science Foundation through the Penn State Center for Nanoscale Science, a NSF MRSEC and the Office of Naval Research.

Abstract

Patterning of solution processed organic semiconductors demonstrated using a non-relief-pattern, photoresist-free, lithographic process with a self-assembled monolayer (SAM) patterned by deep ultraviolet (DUV) irradiation. The patterned, low-surface-energy SAM then steers the organic semiconductor solution into areas where the SAM has been removed by the DUV exposure resulting in organic semiconductor microstructures with good resolution.

original image
Get access to the full text of this article

Ancillary