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Keywords:

  • atom-transfer radical polymerization;
  • line edge roughness;
  • lithography;
  • photoresist;
  • polymeric materials
Thumbnail image of graphical abstract

A chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom-transfer radical polymerization (ATRP) technique, and resists prepared from this hyperbranched polymer present good pattern profiles and line-edge roughness (3σ) values comparable to those of the reference (commercial) resist.