Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances
Article first published online: 4 DEC 2008
Copyright © 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 21, Issue 10-11, pages 1121–1125, March 20, 2009
How to Cite
Chochos, C. L., Ismailova, E., Brochon, C., Leclerc, N., Tiron, R., Sourd, C., Bandelier, P., Foucher, J., Ridaoui, H., Dirani, A., Soppera, O., Perret, D., Brault, C., Serra, C. A. and Hadziioannou, G. (2009), Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances. Adv. Mater., 21: 1121–1125. doi: 10.1002/adma.200801715
- Issue published online: 12 MAR 2009
- Article first published online: 4 DEC 2008
- Manuscript Revised: 14 SEP 2008
- Manuscript Received: 19 JUN 2008
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