Communication

A Chemical Solution Approach to Epitaxial Metal Nitride Thin Films†

  1. Hongmei Luo1,*,
  2. Yuan Lin2,
  3. Haiyan Wang3,
  4. Joon Hwan Lee3,
  5. Natalya A. Suvorova4,
  6. Alexander H. Mueller5,
  7. Anthony K. Burrell1,
  8. T. Mark McCleskey1,
  9. Eve Bauer1,
  10. Igor O. Usov4,
  11. Marilyn E. Hawley4,
  12. Terry G. Holesinger1,
  13. Quanxi Jia1,*

Article first published online: 30 OCT 2008

DOI: 10.1002/adma.200801959

Issue

Advanced Materials

Advanced Materials

Volume 21, Issue 2, pages 193–197, January 12, 2009

Additional Information

How to Cite

Luo, H., Lin, Y., Wang, H., Lee, J. H., Suvorova, N. A., Mueller, A. H., Burrell, A. K., McCleskey, T. M., Bauer, E., Usov, I. O., Hawley, M. E., Holesinger, T. G. and Jia, Q. (2009), A Chemical Solution Approach to Epitaxial Metal Nitride Thin Films. Adv. Mater., 21: 193–197. doi: 10.1002/adma.200801959

Author Information

  1. 1

    Materials Physics and Applications Division Los Alamos National Laboratory Los Alamos, NM 87545 (USA)

  2. 2

    School of Microelectronics and Solid State Electronics University of Electronic Science and Technology of China Chengdu 610054 (P.R. China)

  3. 3

    Department of Electrical and Computer Engineering Texas A&M University College Station, TX 77843 (USA)

  4. 4

    Materials Science and Technology Division Los Alamos National Laboratory Los Alamos, NM 87545 (USA)

  5. 5

    Chemistry Division, Los Alamos National Laboratory Los Alamos, NM 87545 (USA)

*Materials Physics and Applications Division Los Alamos National Laboratory Los Alamos, NM 87545 (USA).

  1. †

    We gratefully acknowledge the support of the US Department of Energy (DOE) through the LANL/LDRD Program, DOE EE-RE Solid State Lighting Program, and NSF/DMR Ceramic Program (NSF 0709831).

Publication History

  1. Issue published online: 2 JAN 2009
  2. Article first published online: 30 OCT 2008
  3. Manuscript Received: 10 JUL 2008

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Keywords:

  • thin films;
  • synthesis;
  • nitrides;
  • polymer-assisted deposition;
  • chemical solution deposition
Thumbnail image of graphical abstract

Epitaxial metal nitride films are prepared using a general chemical solution approach. A polymer-assisted deposition to prepare epitaxial cubic TiN, metastable AlN, and ternary nitride Ti1−xAlxN films is demonstrated. The structural, optical and electrical properties of the films are investigated, and may be of interest for many technological applications.

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