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Hierarchically Ordered Topographic Patterns via Plasmonic Mask Photolithography

Authors

  • Woo Soo Kim,

    1. Institute for Soldier Nanotechnologies Department of Materials Science and Engineering Massachusetts Institute of Technology Cambridge, MA 02139 (USA)
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  • Lin Jia,

    1. Institute for Soldier Nanotechnologies Department of Materials Science and Engineering Massachusetts Institute of Technology Cambridge, MA 02139 (USA)
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  • Edwin L. Thomas

    Corresponding author
    1. Institute for Soldier Nanotechnologies Department of Materials Science and Engineering Massachusetts Institute of Technology Cambridge, MA 02139 (USA)
    • Institute for Soldier Nanotechnologies Department of Materials Science and Engineering Massachusetts Institute of Technology Cambridge, MA 02139 (USA).
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Abstract

original image

By employing a block copolymer to spatially organize silver nanoparticles, laser light can be concentrated via plasmon resonance to locally expose a photoresist. By subsequent development, this plasmonic lithography can provide deep subwavelength scale features.

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