Communication
Direct Laser Writing of Nanosized Oligofluorene Truxenes in UV-Transparent Photoresist Microstructures
Article first published online: 16 DEC 2008
DOI: 10.1002/adma.200802656
Copyright © 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Kuehne, A. J. C., Elfström, D., Mackintosh, A. R., Kanibolotsky, A. L., Guilhabert, B., Gu, E., Perepichka, I. F., Skabara, P. J., Dawson, M. D. and Pethrick, R. A. (2009), Direct Laser Writing of Nanosized Oligofluorene Truxenes in UV-Transparent Photoresist Microstructures. Advanced Materials, 21: 781–785. doi: 10.1002/adma.200802656
Publication History
- Issue published online: 9 FEB 2009
- Article first published online: 16 DEC 2008
- Manuscript Revised: 28 OCT 2008
- Manuscript Received: 8 SEP 2008
Funded by
- EPSRC. Grant Number: GR/T28379
- Basic Technology Programme. Grant Number: GR/S85764
Keywords:
- direct laser writing;
- fluorescing microstructure;
- oligofluorene truxene;
- vinyl ether photoresist
Graphical Abstract

Recently developed star-shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl ether based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo-oxidation of the fluorescent molecules.

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