Communication

Broad-band and Omnidirectional Antireflection Coatings Based on Semiconductor Nanorods

  1. Silke L. Diedenhofen1,*,
  2. Gabriele Vecchi1,
  3. Rienk E. Algra2,3,4,5,
  4. Alex Hartsuiker5,
  5. Otto L. Muskens5,
  6. George Immink6,
  7. Erik P. A. M. Bakkers7,
  8. Willem L. Vos8,9,
  9. Jaime Gómez Rivas1

Article first published online: 14 JAN 2009

DOI: 10.1002/adma.200802767

Issue

Advanced Materials

Advanced Materials

Volume 21, Issue 9, pages 973–978, March 6, 2009

Additional Information

How to Cite

Diedenhofen, S. L., Vecchi, G., Algra, R. E., Hartsuiker, A., Muskens, O. L., Immink, G., Bakkers, E. P. A. M., Vos, W. L. and Rivas, J. G. (2009), Broad-band and Omnidirectional Antireflection Coatings Based on Semiconductor Nanorods. Adv. Mater., 21: 973–978. doi: 10.1002/adma.200802767

Author Information

  1. 1

    FOM Institute for Atomic and Molecular Physics c/o Philips Research Laboratories High Tech Campus 4 5656 AE Eindhoven (The Netherlands)

  2. 2

    c/o Philips Research Laboratories, High Tech Campus 4 5656 AE Eindhoven (The Netherlands)

  3. 3

    Materials Innovation Institute (M2i) 2628 CD Delft (The Netherlands)

  4. 4

    Department of Solid State Chemistry Institute for Molecules and Materials (IMM) Radboud University Toernooiveld 1, 6525 ED Nijmegen (The Netherlands)

  5. 5

    FOM Institute for Atomic and Molecular Physics Kruislaan 407, 1098 SJ Amsterdam (The Netherlands)

  6. 6

    Miplaza Technology Laboratories Philips Research Europe High Tech Campus 29, 5656 AE Eindhoven (The Netherlands)

  7. 7

    Philips Research Laboratories, High Tech Campus 4 5656 AE Eindhoven (The Netherlands)

  8. 8

    FOM Institute for Atomic and Molecular Physics Kruislaan 407, 1098 SJ Amsterdam (The Netherlands)

  9. 9

    Complex Photonic Systems, MESA+ Institute for Nanotechnology, University of Twente 7500 AE Enschede (The Netherlands)

*FOM Institute for Atomic and Molecular Physics c/o Philips Research Laboratories High Tech Campus 4 5656 AE Eindhoven (The Netherlands).

Publication History

  1. Issue published online: 23 FEB 2009
  2. Article first published online: 14 JAN 2009
  3. Manuscript Revised: 19 NOV 2008
  4. Manuscript Received: 17 SEP 2008

Funded by

  • “Nederlandse organisatie voor Wetenschappelijk Onderzoek (NWO)”

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Keywords:

  • Semiconductor;
  • Nanorods;
  • Thin films;
  • GaP;
  • Chemical vapor deposition
Thumbnail image of graphical abstract

A broad-band and omnidirectional antireflection coating consisting of semiconductor nanowires is fabricated. The reflection is reduced due to a graded refractive index, which is achieved by a certain nanorod-length distribution of cylindrical and conically shaped rods. An increased transmission and, accordingly, a reduced reflection are demonstrated for the visible and near-infrared parts of the spectrum.

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