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Advanced Materials

Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns

Authors

  • Yeon Sik Jung,

    1. Department of Materials Science and Engineering Massachusetts Institute of Technology Cambridge, Massachusetts 02139 (USA)
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  • Caroline A. Ross

    Corresponding author
    1. Department of Materials Science and Engineering Massachusetts Institute of Technology Cambridge, Massachusetts 02139 (USA)
    • Department of Materials Science and Engineering Massachusetts Institute of Technology Cambridge, Massachusetts 02139 (USA).
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Abstract

Self-assembly of a block copolymer into cylindrical and/or perforated lamellar arrays within substrate trenches can be extensively tuned during the solvent-annealing process. Following reactive-ion etching, SEM images reveal that the solvent mixing ratio and the vapor pressure determine the type of array obtained and influence the dimensions of the repeat unit.

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