Low-Cost Fabrication of Transparent Hard Replica Molds for Imprinting Lithography

Authors

  • Joohee Kim,

    1. Department of Chemistry and Nano Science Ewha Womans University 11-1 Daehyun-dong, Seodaemun-gu Seoul 120-750 (Korea)
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  • Mihee Kim,

    1. Department of Nano Science and Technology Graduate School of Convergence Science and Technology Seoul National University 864-1 Iui-dong, Yeongtong-gu Suwon-si, Gyeonggi-do 443-72 (Korea)
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  • Min Jung Lee,

    1. Department of Chemistry and Nano Science Ewha Womans University 11-1 Daehyun-dong, Seodaemun-gu Seoul 120-750 (Korea)
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  • Ji Soo Lee,

    1. Department of Chemistry and Nano Science Ewha Womans University 11-1 Daehyun-dong, Seodaemun-gu Seoul 120-750 (Korea)
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  • Kyusoon Shin,

    1. School of Chemical and Biological Engineering Seoul National University San 56-1 Shillim-dong, Kwanak-gu Seoul 151-744 (Korea)
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  • Youn Sang Kim

    Corresponding author
    1. Department of Nano Science and Technology Graduate School of Convergence Science and Technology Seoul National University 864-1 Iui-dong, Yeongtong-gu Suwon-si, Gyeonggi-do 443-72 (Korea)
    • Department of Nano Science and Technology Graduate School of Convergence Science and Technology Seoul National University 864-1 Iui-dong, Yeongtong-gu Suwon-si, Gyeonggi-do 443-72 (Korea).
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Abstract

original image

A new and cost-effective replica fabrication method for transparent and hard molds used in imprinting lithography is presented. The process uses a polymer copy as a carrier. Replicated hard molds eliminate the need for direct contact between the master and the patterned polymer on the substrate, and thus reduce contamination of the master.

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