Al2O3/ZrO2 Nanolaminates as Ultrahigh Gas-Diffusion Barriers—A Strategy for Reliable Encapsulation of Organic Electronics



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Highly efficient gas-diffusion barriers based on nanolaminates of alternating Al2O3 and ZrO2 layers grown at 80 °C by atomic-layer deposition are presented. Ultralow water-vapor permeation rates are reported, and a dramatic reduction of statistical defects on larger areas was found compared to single Al2O3 layers. This study provides a concept for the encapsulation of organic optoelectronic devices.