Nanopatterning via Pressure-Induced Instabilities in Thin Polymer Films

Authors

  • Ximin He,

    1. Melville Laboratory for Polymer Synthesis Department of Chemistry, University of Cambridge Lensfield Road, Cambridge, CB2 1 EW (UK)
    2. The Nanoscience Centre, University of Cambridge 11 J.J. Thomson Avenue Cambridge CB3 0FF (UK)
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  • Jurjen Winkel,

    1. Kodak European Research 332 Science Park, Milton Road Cambridge, CB4 0WN (UK)
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  • Wilhelm T. S. Huck

    Corresponding author
    1. Melville Laboratory for Polymer Synthesis Department of Chemistry, University of Cambridge Lensfield Road, Cambridge, CB2 1 EW (UK)
    2. The Nanoscience Centre, University of Cambridge 11 J.J. Thomson Avenue Cambridge CB3 0FF (UK)
    • Melville Laboratory for Polymer Synthesis Department of Chemistry, University of Cambridge Lensfield Road, Cambridge, CB2 1 EW (UK).
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Abstract

original image

The residual stresses in spin-coated films can be exploited to produce highly controlled nanoscale patterns via pressure-induced local rupturing and dewetting of thin films. Residue-free holes as small as 28 nm in diameter formed over large areas by pressing sharp stamps into polymer films at temperatures well below the glass transition temperature.

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