Advanced Materials

Fabrication of Freestanding Nanoporous Polyethersulfone Membranes Using Organometallic Polymer Resists Patterned by Nanosphere Lithography

Authors

  • Canet Acikgoz,

    1. Molecular Nanofabrication Group MESA+ Institute for Nanotechnology University of Twente, P.O. Box 217, 7500 AE, Enschede (The Netherlands)
    2. Materials Science and Technology of Polymers MESA+ Institute for Nanotechnology University of Twente P.O. Box 217, 7500 AE, Enschede (The Netherlands)
    Search for more papers by this author
  • Xing Yi Ling,

    1. Molecular Nanofabrication Group MESA+ Institute for Nanotechnology University of Twente, P.O. Box 217, 7500 AE, Enschede (The Netherlands)
    Search for more papers by this author
  • In Yee Phang,

    1. Materials Science and Technology of Polymers MESA+ Institute for Nanotechnology University of Twente P.O. Box 217, 7500 AE, Enschede (The Netherlands)
    Search for more papers by this author
  • Mark A. Hempenius,

    1. Materials Science and Technology of Polymers MESA+ Institute for Nanotechnology University of Twente P.O. Box 217, 7500 AE, Enschede (The Netherlands)
    Search for more papers by this author
  • David N. Reinhoudt,

    1. Molecular Nanofabrication Group MESA+ Institute for Nanotechnology University of Twente, P.O. Box 217, 7500 AE, Enschede (The Netherlands)
    Search for more papers by this author
  • Jurriaan Huskens,

    Corresponding author
    1. Molecular Nanofabrication Group MESA+ Institute for Nanotechnology University of Twente, P.O. Box 217, 7500 AE, Enschede (The Netherlands)
    • Molecular Nanofabrication Group MESA+ Institute for Nanotechnology University of Twente, P.O. Box 217, 7500 AE, Enschede (The Netherlands).
    Search for more papers by this author
  • G. Julius Vancso

    Corresponding author
    1. Materials Science and Technology of Polymers MESA+ Institute for Nanotechnology University of Twente P.O. Box 217, 7500 AE, Enschede (The Netherlands)
    • Materials Science and Technology of Polymers MESA+ Institute for Nanotechnology University of Twente P.O. Box 217, 7500 AE, Enschede (The Netherlands).
    Search for more papers by this author

Abstract

Freestanding nanoporous polysulfone membranes are fabricated using nanosphere lithography, in which colloidal silica particles act as a template for the organometallic etch resist, which is composed of poly(ferrocenylsilanes). As shown in the figure, the membranes are robust enough to be removed from the silica wafers where they were produced. They can subsequently be used to separate particles of different sizes.

original image

Ancillary