A grand challenge in 3D nanolithography is to place near-IR photoluminescent guests precisely where desired in a high-refractive-index nanostructured host. This objective has now been reduced to practice, as reported by Georg von Freymann, Sean Wong, and coworkers on p. 4097, by using direct laser writing in an As2S3 all-inorganic photoresist doped with Er3+ ions. Such precise placement is considered a key step towards miniaturized optical, electro-optical, and photonic devices. Cover artwork by M.S. Rill.