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Patterned Wettability Transition by Photoelectric Cooperative and Anisotropic Wetting for Liquid Reprography

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Abstract

An approach to address the precise controllable patterned wettability transition on the superhydrophobic aligned photoconductive nanorod-array surface via a photoelectric cooperative wetting process is described. This work is promising to gear up the application of locally confining liquids at a desired location, such as liquid reprography by patterned-light illumination.

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