SEARCH

SEARCH BY CITATION

Keywords:

  • block copolymer;
  • high etching resistance;
  • hybrid material;
  • POSS
Thumbnail image of graphical abstract

We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.