Communication

One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers

  1. Tomoyasu Hirai1,
  2. Melvina Leolukman3,
  3. Chi Chun Liu2,
  4. Eungnak Han3,
  5. Yun Jun Kim3,
  6. Yoshihito Ishida1,
  7. Teruaki Hayakawa1,*,
  8. Masa-aki Kakimoto1,
  9. Paul F. Nealey2,*,
  10. Padma Gopalan3,*

Article first published online: 24 JUN 2009

DOI: 10.1002/adma.200900518

Issue

Advanced Materials

Advanced Materials

Volume 21, Issue 43, pages 4334–4338, November 20, 2009

Additional Information

How to Cite

Hirai, T., Leolukman, M., Liu, C. C., Han, E., Kim, Y. J., Ishida, Y., Hayakawa, T., Kakimoto, M.-a., Nealey, P. F. and Gopalan, P. (2009), One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers. Adv. Mater., 21: 4334–4338. doi: 10.1002/adma.200900518

Author Information

  1. 1

    Department of Organic and Polymeric Materials Tokyo Institute of Technology 2-12-1-S8-26 O-okayama, Eguro-ku Tokyo 152-8552 (Japan)

  2. 2

    Department of Chemical and Biological Engineering University of Wisconsin Madison, Wisconsin 53706 (USA)

  3. 3

    Department of Materials Science and Engineering University of Wisconsin Madison, Wisconsin 53706 (USA)

*Department of Organic and Polymeric Materials Tokyo Institute of Technology 2-12-1-S8-26 O-okayama, eguro-ku Tokyo 152-8552 (Japan).

Publication History

  1. Issue published online: 19 NOV 2009
  2. Article first published online: 24 JUN 2009
  3. Manuscript Revised: 24 MAR 2009
  4. Manuscript Received: 13 FEB 2009

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Keywords:

  • block copolymer;
  • high etching resistance;
  • hybrid material;
  • POSS
Thumbnail image of graphical abstract

We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.

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