Fabrication of Advanced Functional Devices Combining Soft Chemistry with X-ray Lithography in One Step

Authors

  • Paolo Falcaro,

    Corresponding author
    1. Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT), CR-INSTM Università di Sassari, Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy)
    2. CSIRO, Division of Materials Science and Engineering Private Bag 33, Clayton South MDC, Victoria 3169 (Australia)
    • Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT), CR-INSTM Università di Sassari, Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy).

    Search for more papers by this author
  • Luca Malfatti,

    1. Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT), CR-INSTM Università di Sassari, Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy)
    Search for more papers by this author
  • Lisa Vaccari,

    1. Sincrotrone Trieste S.C.p.A. S.S. 14, Km163.5, 34012 Basovizza TS (Italy)
    Search for more papers by this author
  • Heinz Amenitsch,

    1. Institute of Biophysics and Nanosystems Research, Austrian Academy of Sciences Schmiedlstraße 6, 8042, Graz (Austria)
    Search for more papers by this author
  • Benedetta Marmiroli,

    1. Institute of Biophysics and Nanosystems Research, Austrian Academy of Sciences Schmiedlstraße 6, 8042, Graz (Austria)
    Search for more papers by this author
  • Gianluca Grenci,

    1. TASC, INFM National Laboratory S.S. 14, Km163.5 in Area Science Park, 34012 Basovizza, Trieste (Italy)
    Search for more papers by this author
  • Plinio Innocenzi

    Corresponding author
    1. Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT), CR-INSTM Università di Sassari, Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy)
    • Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT), CR-INSTM Università di Sassari, Palazzo Pou Salid Piazza Duomo 6, 07041 Alghero SS (Italy).

    Search for more papers by this author

Abstract

original image

Deep X-ray lithography combined with sol–gel techniques offers facile fabrication of controlled patterned films. Using sol–gel, different functional properties can be induced; deep X-ray lithography alters the functionality in the exposed regions. Miniaturized devices based on local property changes are easily fabricated: this technique requires no resist, enabling direct patterning of films in a one-step lithographic process.

Ancillary