Communication

Probe-Based 3-D Nanolithography Using Self-Amplified Depolymerization Polymers

  1. Armin W. Knoll1,*,
  2. David Pires1,
  3. Olivier Coulembier2,
  4. Philippe Dubois2,
  5. James L. Hedrick3,
  6. Jane Frommer3,
  7. Urs Duerig1,*

Article first published online: 23 APR 2010

DOI: 10.1002/adma.200904386

Issue

Advanced Materials

Advanced Materials

Special Issue: Stimuli-Sensitive Polymers

Volume 22, Issue 31, pages 3361–3365, August 17, 2010

Additional Information

How to Cite

Knoll, A. W., Pires, D., Coulembier, O., Dubois, P., Hedrick, J. L., Frommer, J. and Duerig, U. (2010), Probe-Based 3-D Nanolithography Using Self-Amplified Depolymerization Polymers. Advanced Materials, 22: 3361–3365. doi: 10.1002/adma.200904386

Author Information

  1. 1

    IBM Research - Zurich, Saeumerstr. 4, 8803 Rueschlikon (Switzerland)

  2. 2

    Laboratory of Polymeric and Composite Materials, University of Mons – UMONS, Place du Parc 20, 7000 Mons (Belgium)

  3. 3

    IBM Research - Almaden, 650 Harry Road, San Jose, CA 95120 (USA)

*IBM Research - Zurich, Saeumerstr. 4, 8803 Rueschlikon (Switzerland).

Publication History

  1. Issue published online: 4 AUG 2010
  2. Article first published online: 23 APR 2010
  3. Manuscript Revised: 26 MAR 2010
  4. Manuscript Received: 12 FEB 2010

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Keywords:

  • Nanolithography;
  • Scanning probe techniques;
  • Surface patterning;
  • Nanopatterning

Graphical Abstract

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3D patterning by means of probe-assisted thermal decomposition has been achieved on phthalaldehyde polymer films with 1 nm vertical resolution and 40 nm lateral resolution. Highly efficient patterning is enabled by a self-amplified depolymerization mechanism. Pixel writing speeds on the order of microseconds are demonstrated.

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