Nanotube Arrays: Morphology Control of Nanotube Arrays (Adv. Mater. 29/2009)

Authors

  • Zhifeng Huang,

    Corresponding author
    1. Department of Electrical and Computer Engineering University of Alberta, AB, T6G 2V4 (Canada).
    • Department of Electrical and Computer Engineering University of Alberta, AB, T6G 2V4 (Canada).
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  • Kenneth D. Harris,

    1. National Research Council Canada National Institute for Nanotechnology 11421 Saskatchewan Drive, Edmonton, AB, T6G 2M9 (Canada)
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  • Michael J. Brett

    Corresponding author
    1. Department of Electrical and Computer Engineering University of Alberta, AB, T6G 2V4 (Canada).
    2. National Research Council Canada National Institute for Nanotechnology 11421 Saskatchewan Drive, Edmonton, AB, T6G 2M9 (Canada)
    • Department of Electrical and Computer Engineering University of Alberta, AB, T6G 2V4 (Canada).
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Abstract

original image

On p. 2983 Michael J. Brett and co-workers demonstrate a template-directed technique to produce arrays of silicon nanotubes (SiNTs) with highly engineerable morphology. Fabrication steps include glancing angle deposition (GLAD) of the templates, low-pressure CVD of a shell-Si coating, ion milling to expose the templates, and wet-chemical etching for removal of the templates. The technique may be generally adapted to a wide variety of morphologies and NT materials.

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