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Keywords:

  • Topological insulator;
  • Molecular beam epitaxy;
  • Thin film;
  • Angle-resolved photoemission spectrscopy;
  • Scanning tunneling microscopy
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High-quality Bi2Te3 films can be grown on Si by the state-of-art molecular beam epitaxy technique. In situ ARPES measurement reveals that the as-grown films are intrinsic topological insulators and the single-Dirac-cone surface state develops at a thickness of two quintuple layers. The work opens a new avenue for engineering of topological materials based on well-developed Si technology.