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Communication

High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates

  1. Neil F. Baril4,
  2. Banafsheh Keshavarzi2,
  3. Justin R. Sparks1,
  4. Mahesh Krishnamurthi3,
  5. Ivan Temnykh3,
  6. Pier J. A. Sazio5,
  7. Anna C. Peacock5,
  8. Ali Borhan2,
  9. Venkatraman Gopalan3,
  10. John V. Badding1,*

Article first published online: 8 SEP 2010

DOI: 10.1002/adma.201001199

Issue

Advanced Materials

Advanced Materials

Volume 22, Issue 41, pages 4605–4611, November 2, 2010

Additional Information

How to Cite

Baril, N. F., Keshavarzi, B., Sparks, J. R., Krishnamurthi, M., Temnykh, I., Sazio, P. J. A., Peacock, A. C., Borhan, A., Gopalan, V. and Badding, J. V. (2010), High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates. Adv. Mater., 22: 4605–4611. doi: 10.1002/adma.201001199

Author Information

  1. 1

    Department of Chemistry and Materials Research Institute, Pennsylvania State University, University Park, PA 16802 (USA)

  2. 2

    Department of Chemical Engineering, Pennsylvania State University, University Park, PA 16802 (USA)

  3. 3

    Department of Materials Science and Engineeering and Materials Research Institute, Pennsylvania State University, University Park, PA 16802 (USA)

  4. 4

    Department of Chemistry, Department of Materials Science and Engineeering and Materials Research Institute, Pennsylvania State University, University Park, PA 16802 (USA)

  5. 5

    Optoelectronics Research Centre, University of Southampton, Southampton, SO17 1BJ (UK)

*Department of Chemistry and Materials Research Institute, Pennsylvania State University, University Park, PA 16802 (USA)

Publication History

  1. Issue published online: 22 OCT 2010
  2. Article first published online: 8 SEP 2010
  3. Manuscript Received: 6 NOV 2010
  4. Manuscript Revised: 2 APR 2010

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