High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates
Version of Record online: 8 SEP 2010
Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 22, Issue 41, pages 4605–4611, November 2, 2010
How to Cite
Baril, N. F., Keshavarzi, B., Sparks, J. R., Krishnamurthi, M., Temnykh, I., Sazio, P. J. A., Peacock, A. C., Borhan, A., Gopalan, V. and Badding, J. V. (2010), High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates. Adv. Mater., 22: 4605–4611. doi: 10.1002/adma.201001199
- Issue online: 22 OCT 2010
- Version of Record online: 8 SEP 2010
- Manuscript Received: 6 NOV 2010
- Manuscript Revised: 2 APR 2010
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