Communication

Graphoepitaxial Assembly of Symmetric Block Copolymers on Weakly Preferential Substrates

  1. Eungnak Han1,
  2. Huiman Kang2,
  3. Chi-Chun Liu2,
  4. Paul F. Nealey2,
  5. Padma Gopalan1,*

Article first published online: 30 AUG 2010

DOI: 10.1002/adma.201001669

Issue

Advanced Materials

Advanced Materials

Volume 22, Issue 38, pages 4325–4329, October 8, 2010

Additional Information

How to Cite

Han, E., Kang, H., Liu, C.-C., Nealey, P. F. and Gopalan, P. (2010), Graphoepitaxial Assembly of Symmetric Block Copolymers on Weakly Preferential Substrates. Adv. Mater., 22: 4325–4329. doi: 10.1002/adma.201001669

Author Information

  1. 1

    Department of Materials Science and Engineering, University of Wisconsin, Madison, Wisconsin 53706 (USA)

  2. 2

    Department of Chemical and Biological Engineering, University of Wisconsin, Madison, Wisconsin 53706 (USA)

*Department of Materials Science and Engineering, University of Wisconsin, Madison, Wisconsin 53706 (USA).

Publication History

  1. Issue published online: 27 SEP 2010
  2. Article first published online: 30 AUG 2010
  3. Manuscript Revised: 19 MAY 2010
  4. Manuscript Received: 31 MAR 2010

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Keywords:

  • graphoepitaxy;
  • block copolymers;
  • directed assembly
Thumbnail image of graphical abstract

Weakly preferential substrates were utilized in a single step process to direct the assembly of symmetric PS-b-PMMA. The thickness dependence of domain orientation on weakly preferential substrates was exploited to dictate the lateral ordering of perpendicular lamellae.

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