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Nano-tailoring the Surface Structure for the Monolithic High-Performance Antireflection Polymer Film

Authors

  • Kiwoon Choi,

    1. Department of Advanced Fiber Engineering, Inha University, 253 Young-hyun-dong, Nam-gu, Incheon, 402–751 (Republic of Korea)
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  • Sung Ho Park,

    1. Department of Advanced Fiber Engineering, Inha University, 253 Young-hyun-dong, Nam-gu, Incheon, 402–751 (Republic of Korea)
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  • Young Min Song,

    1. Department of Information and Communications, Gwangju Institute of Science and Technology, 1 Oryong-dong, Buk-gu, Gwangju, 500–712 (Republic of Korea)
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  • Yong Tak Lee,

    1. Department of Information and Communications, Gwangju Institute of Science and Technology, 1 Oryong-dong, Buk-gu, Gwangju, 500–712 (Republic of Korea)
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  • Chang Kwon Hwangbo,

    1. Department of Physics, Inha University, 253 Young-hyun-dong, Nam-gu, Incheon, 402–751 (Republic of Korea)
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  • Hoichang Yang,

    1. Department of Advanced Fiber Engineering, Inha University, 253 Young-hyun-dong, Nam-gu, Incheon, 402–751 (Republic of Korea)
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  • Han Sup Lee

    Corresponding author
    1. Department of Advanced Fiber Engineering, Inha University, 253 Young-hyun-dong, Nam-gu, Incheon, 402–751 (Republic of Korea)
    • Department of Advanced Fiber Engineering, Inha University, 253 Young-hyun-dong, Nam-gu, Incheon, 402–751 (Republic of Korea).
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Abstract

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Nano-tailoring the shape and dimensions of the parabolic antireflective structure predicted by simulation has been successfully carried out to fabricate monolithic high-performance antireflection (AR) polymer films. The average total reflectivity from an artificial antireflection film is lowered down to 0.64% at a wavelength range of 400 nm to 800 nm, which appears to be the best antireflection performance ever reported for transparent polymer antireflection films.

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