Cubic Silsesquioxanes as a Green, High-Performance Mold Material for Nanoimprint Lithography

Authors

  • Hyun Wook Ro,

    Corresponding author
    1. Polymers Division, National Institute of Standards and Technology (NIST), 100 Bureau Dr., Mail Stop 8541, Gaithersburg, MD 20899, USA
    • Polymers Division, National Institute of Standards and Technology (NIST), 100 Bureau Dr., Mail Stop 8541, Gaithersburg, MD 20899, USA.
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  • Vera Popova,

    1. Mayaterials Inc., 661 Airport Blvd. Suite 1, Ann Arbor, MI 47108, USA
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  • Lei Chen,

    1. Center for Nanoscale Science and Technology, National Institute of Standards and Technology (NIST), 100 Bureau Dr., Mail Stop 6201, Gaithersburg, MD 20899, USA
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  • Aaron M. Forster,

    1. Materials and Construction Research Division, National Institute of Standards and Technology (NIST), 100 Bureau Dr., Mail Stop 8615, Gaithersburg, MD 20899, USA
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  • Yifu Ding,

    1. Polymers Division, National Institute of Standards and Technology (NIST), 100 Bureau Dr., Mail Stop 8541, Gaithersburg, MD 20899, USA
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  • Kyle J. Alvine,

    1. Polymers Division, National Institute of Standards and Technology (NIST), 100 Bureau Dr., Mail Stop 8541, Gaithersburg, MD 20899, USA
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  • Dave J. Krug,

    1. Mayaterials Inc., 661 Airport Blvd. Suite 1, Ann Arbor, MI 47108, USA
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  • Richard M. Laine,

    1. Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI 48109, Michigan 48109-2136, USA
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  • Christopher L. Soles

    Corresponding author
    1. Polymers Division, National Institute of Standards and Technology (NIST), 100 Bureau Dr., Mail Stop 8541, Gaithersburg, MD 20899, USA
    • Polymers Division, National Institute of Standards and Technology (NIST), 100 Bureau Dr., Mail Stop 8541, Gaithersburg, MD 20899, USA.
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Abstract

original image

One-step direct nanoimprinting into cubic-silsesquioxane (SSQ) films create low surface energy, high-modulus, thermally stable, and UV-transparent patterns that can then be used as secondary molds for both thermal and UV versions of nanoimprinting. The optimization of these materials is demonstrated by varying the microstructure of the initial SSQ material. The pattern fidelity for features as small as 10 nm is quantified using X-ray reflectivity and AFM.

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